ASML and TSMC target a 12-inch photomask pilot line by 2031
The initiative seeks a larger mask format for High NA EUV lithography
Event / data period: 2026-09-07
Published: · Updated:
ASML and TSMC said they formed an industry initiative on 7 September to support a transition to 12-inch photomasks. The semiconductor industry has long relied on 6-inch masks; the partners say a larger format could support the use of High NA EUV lithography.
The companies target a 12-inch mask pilot line by 2031 and readiness of lithography systems for advanced-node production by 2033. These are industry-wide partner targets, not a Dutch production line or completed capacity.
Data
ASML and TSMC initiative for 12-inch photomasks, announced milestones
Company targets for an industry initiative; the pilot line and system readiness are future milestones
| 12-inch photomask pilot line | Targeted by 2031 |
| Lithography system readiness for advanced-node production | Targeted by 2033 |
Methodology
Targets from ASML and TSMC’s September 2026 announcement for a global industry initiative; these are future milestones.
Updated:
Subjects and places
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- Science and technologySuggested
- Preserved editorial category/topic; broad candidate onlyinvestor.asml.com ↗
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- Netherlands · Place role: Coverage · Place type: Country or area · Location precision: RegionalEvidence
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