# ASML and TSMC target a 12-inch photomask pilot line by 2031

> The initiative seeks a larger mask format for High NA EUV lithography

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- Publisher: Newsverum
- Section: Technology
- Country: Netherlands
- Published: 2026-10-07T21:41:38+00:00
- Updated: 2026-10-07T21:41:38+00:00
- Event / data period: 2026-09-07
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ASML and TSMC said they formed an industry initiative on 7 September to support a transition to 12-inch photomasks. The semiconductor industry has long relied on 6-inch masks; the partners say a larger format could support the use of High NA EUV lithography.

The companies target a 12-inch mask pilot line by 2031 and readiness of lithography systems for advanced-node production by 2033. These are industry-wide partner targets, not a Dutch production line or completed capacity.

## Data

### ASML and TSMC initiative for 12-inch photomasks, announced milestones

Company targets for an industry initiative; the pilot line and system readiness are future milestones

Methodology: Targets from ASML and TSMC’s September 2026 announcement for a global industry initiative; these are future milestones.

| Milestone | Announced target |
|---|---|
| 12-inch photomask pilot line | Targeted by 2031 |
| Lithography system readiness for advanced-node production | Targeted by 2033 |

Sources: <https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv> · Download data: [JSON](https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=en&format=json) · [CSV](https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=en&format=csv)

## Sources

- [ASML Holding N.V. and Taiwan Semiconductor Manufacturing Company (TSMC)](<https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv>) (Source checked: 2026-10-07; Published: 2026-09-08)

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