{"article":{"annotation":{"article_id":"asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031","available_at":"2026-10-11T21:37:30.799476Z","geography_revision":"ef6ee0010dda5fe7b240fd514749b43e214c57da73222d2e40ec83b276dd0977","id":"ce1e76e11fb2089a26016120f7c532bc34cca2db8830b485c38c95ba4c6ba2ba","input_sha256":"a1a33f27770b273e6e721bf2c8331b5fead23fad6c1a3b06226ec332e353a5df","limitations":["Rule-derived subjects are candidates, not verified editorial labels or calibrated model probabilities.","Coverage is distinct from event location. 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L’industrie des semi-conducteurs utilise depuis longtemps des masques de 6 pouces ; les partenaires estiment qu’un format plus grand pourrait faciliter l’usage de la lithographie High NA EUV.","Les sociétés visent une ligne pilote de masques de 12 pouces d’ici 2031 et la préparation de systèmes lithographiques à la production de nœuds avancés d’ici 2033. Il s’agit d’objectifs sectoriels des partenaires, pas d’une ligne de production néerlandaise ni d’une capacité déjà achevée."],"sections":[]},"corrections":[],"country":"NL","data":{"blocks":[{"columns":[{"key":"milestone","label":{"ar":"المعلم","de":"Meilenstein","en":"Milestone","es":"Hito","fr":"Étape","pt":"Marco","tr":"Kilometre taşı"},"language":"en","type":"text"},{"key":"target","label":{"ar":"الهدف المعلن","de":"Angekündigtes Ziel","en":"Announced target","es":"Objetivo anunciado","fr":"Objectif annoncé","pt":"Meta anunciada","tr":"Duyurulan hedef"},"language":"en","type":"text"}],"description":{"ar":"أهداف شركات لمبادرة صناعية؛ فالخط التجريبي وجاهزية الأنظمة معالم مستقبلية","de":"Unternehmensziele einer Brancheninitiative; Pilotlinie und Systembereitschaft sind künftige Meilensteine","en":"Company targets for an industry initiative; the pilot line and system readiness are future milestones","es":"Objetivos empresariales de una iniciativa sectorial; la línea piloto y la preparación de sistemas son hitos futuros","fr":"Objectifs des entreprises pour une initiative sectorielle ; la ligne pilote et la préparation des systèmes restent à venir","pt":"Metas empresariais de uma iniciativa industrial; a linha-piloto e a prontidão dos sistemas são marcos futuros","tr":"Sektör girişimi için şirket hedefleri; pilot hattı ve sistem hazırlığı geleceğe yönelik kilometre taşlarıdır."},"id":"reported-figures","methodology":{"ar":"أهداف إعلان ASML وTSMC في سبتمبر 2026 لمبادرة صناعية عالمية؛ وهي معالم مستقبلية.","de":"Ziele aus der ASML-TSMC-Ankündigung vom September 2026 für eine globale Brancheninitiative; künftige Meilensteine.","en":"Targets from ASML and TSMC’s September 2026 announcement for a global industry initiative; these are future milestones.","es":"Objetivos del anuncio de ASML y TSMC de septiembre de 2026 para una iniciativa mundial; son hitos futuros.","fr":"Objectifs de l’annonce ASML-TSMC de septembre 2026 pour une initiative mondiale ; il s’agit d’étapes futures.","pt":"Metas do anúncio da ASML e TSMC de setembro de 2026 para uma iniciativa global; são marcos futuros.","tr":"Eylül 2026'da duyurulan küresel yarı iletken sektörü girişiminin şirket hedefleri; belirtilen tarihler gelecekteki kilometre taşlarıdır."},"rows":[{"milestone":"12-inch photomask pilot line","target":"Targeted by 2031"},{"milestone":"Lithography system readiness for advanced-node production","target":"Targeted by 2033"}],"sourceUrls":["https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv"],"title":{"ar":"مبادرة ASML وTSMC للأقنعة بقياس 12 بوصة، معالم معلنة","de":"ASML-TSMC-Initiative zu 12-Zoll-Photomasken, angekündigte Meilensteine","en":"ASML and TSMC initiative for 12-inch photomasks, announced milestones","es":"Iniciativa de ASML y TSMC para fotomáscaras de 12 pulgadas, hitos anunciados","fr":"Initiative ASML-TSMC sur les photomasques de 12 pouces, étapes annoncées","pt":"Iniciativa da ASML e TSMC para fotomáscaras de 12 polegadas, marcos anunciados","tr":"ASML-TSMC'nin 12 inç fotomaske girişimi için duyurduğu kilometre taşları"},"type":"table","updatedAt":"2026-10-07T20:44:41Z"}],"version":1},"data_downloads":[{"formats":{"csv":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=fr&format=csv","json":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=fr&format=json"},"id":"reported-figures"}],"data_types":["table"],"editorial_illustration":{"alt":"Illustration conceptuelle de la technologie, des processeurs et des informations 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conceptuelle de la technologie, des processeurs et des informations 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Holding N.V. and Taiwan Semiconductor Manufacturing Company (TSMC)","publishedAt":"2026-09-08","url":"https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv"}],"summary":"L’initiative vise un format de masque plus grand pour la lithographie High NA EUV","text":"L’initiative vise un format de masque plus grand pour la lithographie High NA EUV\n\nASML et TSMC ont annoncé avoir créé le 7 septembre une initiative sectorielle pour soutenir le passage aux photomasques de 12 pouces. L’industrie des semi-conducteurs utilise depuis longtemps des masques de 6 pouces ; les partenaires estiment qu’un format plus grand pourrait faciliter l’usage de la lithographie High NA EUV.\n\nLes sociétés visent une ligne pilote de masques de 12 pouces d’ici 2031 et la préparation de systèmes lithographiques à la production de nœuds avancés d’ici 2033. Il s’agit d’objectifs sectoriels des partenaires, pas d’une ligne de production néerlandaise ni d’une capacité déjà achevée.","title":"ASML et TSMC visent une ligne pilote de photomasques de 12 pouces d’ici 2031","topics":[],"translations":[{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=tr","language":"tr","url":"https://newsverum.com/tr/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=en","language":"en","url":"https://newsverum.com/en/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=ar","language":"ar","url":"https://newsverum.com/ar/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=fr","language":"fr","url":"https://newsverum.com/fr/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=es","language":"es","url":"https://newsverum.com/es/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=de","language":"de","url":"https://newsverum.com/de/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=pt","language":"pt","url":"https://newsverum.com/pt/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"}],"url":"https://newsverum.com/fr/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},"version":"1"}