{"article":{"annotation":{"article_id":"asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031","available_at":"2026-10-11T21:37:30.799476Z","geography_revision":"ef6ee0010dda5fe7b240fd514749b43e214c57da73222d2e40ec83b276dd0977","id":"ce1e76e11fb2089a26016120f7c532bc34cca2db8830b485c38c95ba4c6ba2ba","input_sha256":"a1a33f27770b273e6e721bf2c8331b5fead23fad6c1a3b06226ec332e353a5df","limitations":["Rule-derived subjects are candidates, not verified editorial labels or calibrated model probabilities.","Coverage is distinct from event location. 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The semiconductor industry has long relied on 6-inch masks; the partners say a larger format could support the use of High NA EUV lithography.","The companies target a 12-inch mask pilot line by 2031 and readiness of lithography systems for advanced-node production by 2033. These are industry-wide partner targets, not a Dutch production line or completed capacity."],"sections":[]},"corrections":[],"country":"NL","data":{"blocks":[{"columns":[{"key":"milestone","label":{"ar":"المعلم","de":"Meilenstein","en":"Milestone","es":"Hito","fr":"Étape","pt":"Marco","tr":"Kilometre taşı"},"language":"en","type":"text"},{"key":"target","label":{"ar":"الهدف المعلن","de":"Angekündigtes Ziel","en":"Announced target","es":"Objetivo anunciado","fr":"Objectif annoncé","pt":"Meta anunciada","tr":"Duyurulan hedef"},"language":"en","type":"text"}],"description":{"ar":"أهداف شركات لمبادرة صناعية؛ فالخط التجريبي وجاهزية الأنظمة معالم مستقبلية","de":"Unternehmensziele einer Brancheninitiative; Pilotlinie und Systembereitschaft sind künftige Meilensteine","en":"Company targets for an industry initiative; the pilot line and system readiness are future milestones","es":"Objetivos empresariales de una iniciativa sectorial; la línea piloto y la preparación de sistemas son hitos futuros","fr":"Objectifs des entreprises pour une initiative sectorielle ; la ligne pilote et la préparation des systèmes restent à venir","pt":"Metas empresariais de uma iniciativa industrial; a linha-piloto e a prontidão dos sistemas são marcos futuros","tr":"Sektör girişimi için şirket hedefleri; pilot hattı ve sistem hazırlığı geleceğe yönelik kilometre taşlarıdır."},"id":"reported-figures","methodology":{"ar":"أهداف إعلان ASML وTSMC في سبتمبر 2026 لمبادرة صناعية عالمية؛ وهي معالم مستقبلية.","de":"Ziele aus der ASML-TSMC-Ankündigung vom September 2026 für eine globale Brancheninitiative; künftige Meilensteine.","en":"Targets from ASML and TSMC’s September 2026 announcement for a global industry initiative; these are future milestones.","es":"Objetivos del anuncio de ASML y TSMC de septiembre de 2026 para una iniciativa mundial; son hitos futuros.","fr":"Objectifs de l’annonce ASML-TSMC de septembre 2026 pour une initiative mondiale ; il s’agit d’étapes futures.","pt":"Metas do anúncio da ASML e TSMC de setembro de 2026 para uma iniciativa global; são marcos futuros.","tr":"Eylül 2026'da duyurulan küresel yarı iletken sektörü girişiminin şirket hedefleri; belirtilen tarihler gelecekteki kilometre taşlarıdır."},"rows":[{"milestone":"12-inch photomask pilot line","target":"Targeted by 2031"},{"milestone":"Lithography system readiness for advanced-node production","target":"Targeted by 2033"}],"sourceUrls":["https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv"],"title":{"ar":"مبادرة ASML وTSMC للأقنعة بقياس 12 بوصة، معالم معلنة","de":"ASML-TSMC-Initiative zu 12-Zoll-Photomasken, angekündigte Meilensteine","en":"ASML and TSMC initiative for 12-inch photomasks, announced milestones","es":"Iniciativa de ASML y TSMC para fotomáscaras de 12 pulgadas, hitos anunciados","fr":"Initiative ASML-TSMC sur les photomasques de 12 pouces, étapes annoncées","pt":"Iniciativa da ASML e TSMC para fotomáscaras de 12 polegadas, marcos anunciados","tr":"ASML-TSMC'nin 12 inç fotomaske girişimi için duyurduğu kilometre taşları"},"type":"table","updatedAt":"2026-10-07T20:44:41Z"}],"version":1},"data_downloads":[{"formats":{"csv":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=en&format=csv","json":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031/data/reported-figures?lang=en&format=json"},"id":"reported-figures"}],"data_types":["table"],"editorial_illustration":{"alt":"Conceptual illustration of technology, processors and connected 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Holding N.V. and Taiwan Semiconductor Manufacturing Company (TSMC)","publishedAt":"2026-09-08","url":"https://investor.asml.com/news-releases/news-release-details/asml-and-tsmc-announce-initiative-pioneer-industry-transition-large-format-photomasks-high-na-euv"}],"summary":"The initiative seeks a larger mask format for High NA EUV lithography","text":"The initiative seeks a larger mask format for High NA EUV lithography\n\nASML and TSMC said they formed an industry initiative on 7 September to support a transition to 12-inch photomasks. The semiconductor industry has long relied on 6-inch masks; the partners say a larger format could support the use of High NA EUV lithography.\n\nThe companies target a 12-inch mask pilot line by 2031 and readiness of lithography systems for advanced-node production by 2033. These are industry-wide partner targets, not a Dutch production line or completed capacity.","title":"ASML and TSMC target a 12-inch photomask pilot line by 2031","topics":[],"translations":[{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=tr","language":"tr","url":"https://newsverum.com/tr/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=en","language":"en","url":"https://newsverum.com/en/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=ar","language":"ar","url":"https://newsverum.com/ar/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=fr","language":"fr","url":"https://newsverum.com/fr/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=es","language":"es","url":"https://newsverum.com/es/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=de","language":"de","url":"https://newsverum.com/de/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},{"api_url":"https://newsverum.com/api/v1/articles/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031?lang=pt","language":"pt","url":"https://newsverum.com/pt/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"}],"url":"https://newsverum.com/en/news/asml-tsmc-industry-initiative-targets-12-inch-photomask-pilot-by-2031"},"version":"1"}